ellipsometry

AJA International, Inc. is a manufacturer of thin film deposition systems including magnetron sputtering, e-beam evaporation, thermal evaporation, and ion milling systems. Founded in Scituate, MA, USA in 1989 by William Hale, the company was established as a supplier of innovative physical vapor deposition (PVD) products. It also offers thin film deposition and characterization services in its applications lab.

combinatorial chemistrye-beam evaporationfour point probe measurementHiPIMSion millingmagnetron sputteringscanning electron microscopysputter beam epitaxythermal evaporationthin-film deposition

Arradiance designs and manufactures atomic layer deposition (ALD) and molecular layer deposition (MLD) systems for university and corporate R&D labs, including the GEMStar XT and PRIME product families. The company also runs an ALD and MLD coating foundry in Littleton, Massachusetts, offering rapid-turn coating services. Founded in 2003 with a DARPA contract to develop electron field-emission arrays using microchannel technology, Arradiance has acquired Lotus Applied Technology.

atomic layer depositioncoating servicesmolecular layer depositionplasma-enhanced ALDroll-to-roll ALDspatial ALDthermal ALD

Axometrics, Inc. was formed in 2002 to meet the polarization measurement needs of optics professionals, founded by Matthew H. Smith, Ph.D. and Russell Chipman, Ph.D. The company manufactures Mueller matrix polarization measurement systems, including the AxoScan, AxoStep, and EllipsoStep instruments, used in R&D laboratories, quality control, and production for determining the polarization properties of materials and optical components.

birefringence mappingimaging polarimetryLCD cell gap testingMueller matrix polarization measurementpolarization ray tracingsystem developmentthin film measurement

Film Sense designs and manufactures compact, affordable multi-wavelength ellipsometer systems for thin film metrology. Their instruments use long-life LEDs and a no-moving-parts ellipsometric detector to measure film thickness of transparent thin films from 0 to 5000 nm in about one second, as well as optical constants n and k. Applications include research labs, classrooms, in situ process control, and industrial quality control, including ALD and ALE process characterization. The company was founded in 2013 by Blaine Johs.

automated wafer mappingin situ process monitoringoptical constants measurementthin film thickness measurement